摘要
分别采用单槽法和双槽法电沉积Cu/Co多层膜.研究了两种电沉积方法制备多层膜的工艺条件,利用电化学方法、XRD和SEM对多层膜进行表征,并对Cu/Co多层膜的巨磁阻性能进行了测试.采用电沉积多层膜的方法,以多孔铝阳极氧化膜(AAO)为模板,在纳米孔内沉积Cu/Co多层线,采用TEM对多层纳米线进行了表征.
Cu/Co multilayers were prepared by single bath technology (SBT) and double bath technology (DBT),respectively.The technological conditions of SBT and DBT were studied.Using electrochemical method ,XRD and SEM,the layer structureof the prepared multilayer was affirmed.The magnetoresistance property of Cu/Comultilayers was measured and the results show that the GMR of Cu/Co multilayersis 7.5%at 2500 Gs.On the base of the preparation of Cu/Co multilayers,Cu/Co multilayer nanowires arrays on porous anodic aluminum oxide templates were fabricated and its structure was characterized by TEM.The micrographs exhibited that the diameter of the Cu/Co multilayer nanowires is about 120 nm and length up to 10 μm.
出处
《物理化学学报》
SCIE
CAS
CSCD
北大核心
2003年第2期177-180,共4页
Acta Physico-Chimica Sinica
基金
国家自然科学基金(50271046)
教育部
天津大学南开大学联合研究院资助项目~
关键词
电沉积
纳米多层膜
多层纳米线
巨磁电阻
GMR
Electrodeposition, Nanomultilayers, Multilayer nanowires, Giant Magnetoresistance(GMR)
