摘要
采用单槽控电位双脉冲技术在n-Si(111)晶面上制备了[Ni80Fe20/Cu]n多层膜,用SEM观测了多层膜的断面形貌,利用X射线衍射(XRD)表征了多层膜的超晶格结构。采用四探针法研究了多层膜的巨磁电阻(GMR)性能,结果表明,多层膜的GMR值随着Cu层厚度的变化发生周期性振荡,随着NiFe层厚度的增加先增大后减小;当样品结构为[NiFe(1.6nm)/Cu(2.6nm)]80时,GMR值可达6.4%;多层膜的最低饱和磁场仅为750Oe。磁滞回线测试结果表明,反铁磁耦合多层膜具有较小的矩形比,更适宜作为磁头材料。
[Ni80 Fe20/Cu]n multilayers were fabricated onto n-Si （111） substrates by double pulse potentiostatic electrodeposition from single bath. The typical cross-sectional image of multilayer was observed by SEM, and the superlattice structure was characterized by high-angle X-ray diffraction. The giant magnetoresistance （GMR） properties of multilayers were investigated by four-probe technique. The results indicated that with the increase of Cu layer thickness, GMR value showed a periodical oscillation tendency, while increasing the thickness of NiFe layers, GMR value decreased after reaching its maximum. The room-temperature GMR value was up to 6.4% for [NiFe （1.6 nm） /Cu （2.6 nm）]80, and the minimum saturation field was only 750Oe. Hysteresis loops revealed that the anti-ferromagnetic coupled multilayers with a small squareness ratio were suitable for magnetic head materials.
出处
《化工学报》
EI
CAS
CSCD
北大核心
2008年第2期503-507,共5页
CIESC Journal
基金
国家自然科学基金项目(50071039
50271046)
教育部博士点基金项目(20030056034)~~
关键词
电沉积
多层膜
巨磁电阻
超晶格
NiFe/Cu
electrodeposition
multilayers
giant magnetoresistance
superlattice
NiFe/Cu
