摘要
碳酰氟作为一种清洁、环保的气体,在半导体刻蚀、清洗方面具有重要应用。围绕电子级碳酰氟的制备和纯化工艺进行综述,首先介绍了碳酰氟的氟化法、氧化法、催化裂解法3种类型的制备工艺,然后又简述了低温精馏法、化学反应法和膜分离法在电子级碳酰氟纯化过程中的应用。
As a kind of clean and environmentally friendly gas,carbonic difluoride has important applications in semiconductor etching and cleaning.This review focuses on the preparation and purification technology of electronic grade carbonic difluoride.First,three types of preparation technology of fluorination,oxidation and catalytic cracking process are introduced,and then the application of low temperature distillation,chemical reaction method and membrane separation method in the purification process of electronic grade carbonic difluoride are briefly described.
作者
王珂
张玉强
袁胜芳
周志翔
WANG Ke;ZHANG Yuqiang;YUAN Shengfang;ZHOU Zhixiang(Haohua Gas Co.,Ltd.,Luoyang 471012,China)
出处
《低温与特气》
CAS
2024年第6期1-5,共5页
Low Temperature and Specialty Gases
基金
集成电路用电子化学品关键技术研究及产业化(221100230400)。
关键词
碳酰氟
制备
纯化
carbonic difluoride
preparation
purification
