摘要
碳酰氟是一种应用于半导体设备刻蚀和清洗的新型材料,在有机合成及氟化物的干燥、纯化领域也有重要应用。目前国内外关于碳酰氟的制备报道有很多,根据原料种类大体可分为四类,其中CO作为原料制备碳酰氟是应用最多的方法。作为应用于半导体行业的电子气体,对于纯度有一定的要求,因此碳酰氟的纯化也是制约其工业化应用的重要因素。
Carbonyl fluoride is a new type of material used in semiconductor devices for etching and cleaning. Carbonyl flu- oride has many important applications, such as organic synthesis, the drying and purification of fluoride. At present, many reports are focused on the preparation of carbonyl fluoride. According to the types of raw materials, it can be divided into four categories, of which CO as raw material is the most widely used method to prepare carbonyl fluoride. When carbonyl fluoride is applied in the semiconductor industry as electronic gases, there are certain requirements for purification. Thus, the purification of carbonyl fluoride is the restrict factor for its industrial applications.
出处
《低温与特气》
CAS
2017年第1期1-3,6,共4页
Low Temperature and Specialty Gases
关键词
碳酰氟
制备
纯化
应用
carbonyl fluoride
preparation
purification
application
