摘要
Recently,with the rapid development of chemical vapor deposition(CVD)technology,large area free-standing CVD diamond films have been produced successfully.However,the coarse grain size on the surface and the non-uniform thickness of unprocessed CVD diamond films make it difficult to meet the application requirement.The current study evaluates several existing polishing methods for CVD diamond films,including mechanical polishing,chemical mechanical polishing and tribochemical polishing technology.
Recently, with the rapid development of chemical vapor deposition(CVD) technology, large area free-standing CVD diamond films have been produced successfully. However, the coarse grain size on the surface and the non-uniform thickness of unprocessed CVD diamond films make it difficult to meet the application requirement. The current study evaluates several existing polishing methods for CVD diamond films, including mechanical polishing, chemical mechanical polishing and tribochemical polishing technology.
出处
《金刚石与磨料磨具工程》
CAS
北大核心
2019年第6期53-61,共9页
Diamond & Abrasives Engineering
基金
Science and technology plan project of Hebei Academy of Sciences(No.191408)
Natural Science Foundation of Hebei Province(E2019302005)
