摘要
利用磁过滤等离子体沉积技术在单晶Si和碳钢衬底上生长一层NbN沉积膜 ,用XPS ,XRD和SEM对膜层进行测量和分析 ,结果表明 ,沉积膜为δ NbN ,沉积膜的质量与样品的衬底温度有关 ,衬底温度越高 ,生成的膜越致密 ,膜的表面越平整光滑。多次循环阳极极化扫描曲线测量表明 ,沉积膜样品的致钝电流密度 (Ip)较碳钢降低 (1～ 2 )个数量级 ,抗腐蚀性能大幅度提高。
NbN films were grown by vacuum arc plasma deposition (VAPD) on the substrates of Si wafer and carbon steel,respectively.The microstructures and phases of the film were studied with X ray diffraction (XRD),X ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM).We found that the phase of the film is δ NbN and the substrate temperature significantly affects the quality of the film.Higher substrate temperature results in denser film with smoother surfaces.The results of electrochemical polarization measurements show that the passivating currrent density ( I p) of the NbN film deposited on the carbon steel is (1～2) order of magnitudes lower than that of the bare carbon steel.We may conclude that NbN film considerably increases the corrosion resistance of carbon steel.
出处
《真空科学与技术》
CSCD
北大核心
2002年第5期395-398,共4页
Vacuum Science and Technology
