摘要
介绍了阴极真空弧沉积中 ,弧源在阴极接地和阳极接地两种不同工作状态下的工作特性。发现阳极接地时 ,因沉积靶室入口法兰的第二阳极作用 ,聚焦磁场对弧源放电稳定性的影响不如阴极接地时明显。因此可以加较高的聚焦磁场 。
The inlet flange of the deposition chamber was found to behave as a second anode and considerably weaken the influence of focusing magnetic field on the stability of arc discharge characteristics in film growth by vacuum arc plasma deposition,when either the anode or the cathode of our lab made plasma source,called MEVVA,is grounded.We propose that stronger magnetic field applied may result in higher ion intensity and more stable plasma beams in the film growth.
出处
《真空科学与技术》
CSCD
北大核心
2003年第1期68-70,共3页
Vacuum Science and Technology
基金
国家"八六三"计划 (863 715 0 0 8 0 0 40 )
