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正性光致抗蚀剂用酚醛树脂的制备 被引量:3

Preparation of Cresol-formaldehyde Resins Used for Making Positive Photoresist
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摘要 采用4-甲基苯酚、3-甲基苯酚与甲醛,经两步法反应制备了一系列正性光致抗蚀剂用酚醛树脂.制备的酚醛树脂的重均相对分子质量及相对分子质量分布分别在(5~17)×103和2.75~11.67范围内.探讨了甲醛用量、反应时间、催化剂用量、水选对相对分子质量及相对分子质量分布的影响.增加甲醛和催化剂用量将使相对分子质量增大、相对分子质量分布变宽.延长反应时间也将使相对分子质量分布变宽.但增加水洗次数将使相对分子质量减小相对分子质量分布变窄.结果表明,通过改变反应条件可有效地控制酚醛树脂的相对分子质量及相对分子质量分布. In this article, we report the preparation of cresol - fonnaldehyde resins used for making positive photoresist by condensation polymerization of 4 - methylphenol and 3 - methylphenol as well as formaldehyde. The cresol - fonnaldehyde resins with weight average molecular weights of (5 - 17) × 103 and polydispersities of 2.75 - 11.67 were formed. The effect of formaldehyde dosage、catalyst osage、reaction time et al on the molecular weight and molecular weight distribution of cresol - fonnaldehyde resin was investigated by GPC. We found that increasing the dosage of formaldehyde and catalyst would make the molecular weight of cresol - fonnaldehyde resin larger and their molecular weight distribution wider. With increasing of reaction time, the molecular weight distribution of cresol - formaldehyde resin became wider too. However, increasing times of washing with deionized water would make the molecular weight of cresol - formaldehyde resin smaller and their molecular weight distribution narrower. The results showed that varying reaction conditions might effectively control the molecular weight and molecular weight distribution of cresol - formaldehyde resin.
出处 《化工时刊》 CAS 2002年第4期21-24,共4页 Chemical Industry Times
关键词 正性光致抗蚀剂 酚醛树脂 制备 相对分子质量 甲醛 Photoresist, Cresol - formaldehyde resin, Molecular weight, Formaldehyde
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