摘要
用原子力显微镜测定了Si TiN Pd基体 ,经不同沉积时间得到的非晶Ni 13.1wt%Cu 9.3wt%P薄膜的表面形貌 ,得到了AFM图像的多重分形谱 .结果表明 :随着沉积时间的增加 ,多重分形谱的宽度增加 ,Δf(Δf =f(αmin) -f(αmax) )增大 .说明沉积表面高度分布随着沉积时间的增加 ,不均匀性显著增加 ,镀层在水平和垂直方向生长并逐渐形成连续致密的镀层 .
The surface topographies of Si/TiN/Pd substrate and amorphous electroless Ni-13.1wt% Cu-9.3wt% P alloy deposited in various time were measured with an atomic force microscope (AFM). Multifractal spectra f(α) show that the longer the deposition time, the wider the spectrum, and the larger the Δf(Δf=f(α min)-f(α max)).It is apparent that the nonuniformity of the height distribution increases with increasing deposition time, and the nodules of Ni-Cu-P alloy grow in both borizontal and vertical directions. These results show that the AFM images can be characterized by the multifractal spectra.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2002年第5期999-1003,共5页
Acta Physica Sinica
基金
国家"九五"科学仪器科技攻关 (批准号 :96 A2 3 0 0 2 )资助的课题~~
