摘要
采用直流辉光等离子体助进热丝化学气相沉积 (CVD)的方法 ,低温 (5 5 0— 62 0℃ )沉积得到晶态金刚石薄膜。经 X射线衍射谱 (XRD)、扫描电子显微镜 (SEM)分析表明 :稍高气压有利于金刚石薄膜的快速。
The diamond films were deposited at low temperature (550-620℃)using glow plasma HFCVD(hot filament chemical vapor deposition).The morphology and structure properties of samples have been analyzed by scanning electron microscopy (SEM) It X ray diffraction (XRD).It is conc luded that high pressure is the optimum condition for diamond films growth.This conclusion is explained by the result of the Langmuir single probe diagnosis.
出处
《光谱实验室》
CAS
CSCD
2002年第1期137-139,共3页
Chinese Journal of Spectroscopy Laboratory
基金
河北省自然科学基金资助项目 (5 990 91)
