摘要
多晶硅薄膜是集晶体硅材料和非晶硅氢合金薄膜优点于一体 ,在能源科学、信息科学的微电子技术中有广泛应用的一种新型功能材料。本文综述低温 ( <6 0 0℃ )制备高质量多晶硅薄膜技术的研究进展及其应用 ,着重讨论用等离子体化学气相沉积 (PECVD)硅基薄膜固相晶化制备多晶硅技术及其在薄膜硅太阳能电池上的应用。
Poly silicon film is a new functional material, which has both the advantages of c Si and a Si∶H films. It′s applied widely in energy science, micro electronics technology of information science. We summarize the research progress of the preparation techniques at low temperature(<600℃) and its application of the high quality poly silicon film. We have the emphasis on discussing the preparation techniques of poly silicon films which deposited by plasma enhanced chemical vapor deposition (PECVD) and crystallized on solid phase (SPC), and its application to silicon thin film solar cells.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2001年第6期561-563,共3页
Journal of Functional Materials
