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高质量光学薄膜制备用新型无栅霍尔离子束辅助镀膜系统 被引量:3

A new type gridless hall ion beam assisted deposition system for preparing high quality optic thin films
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摘要 介绍一种无栅霍尔离子束辅助镀膜系统。并对该系统的特点、性能和应用结果作了叙述。 This paper introduces a gridless Hall ion beam assisted deposition system.In this paper,the feature and performance of this ion surce are described.The preliminary results for preparing optic thin films are presented.
出处 《光学仪器》 2001年第5期45-48,共4页 Optical Instruments
关键词 无栅霍尔离子源 离子束辅助沉积 光学薄膜 制备 gridless hall ion source ion beam assisted deposition optic thin film
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参考文献2

  • 1W Ensinger.Low Energy Ion Assist During Deposition-An Effective Tool for Controlling Thin Film Microstructure[].Nuclear Instruments.1997
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同被引文献17

  • 1徐治国,王金川,肖国青,郭忠言,武丽杰,张力,毛瑞士.法拉第筒阵列探测器在电子束束流均匀度测量中的应用[J].核电子学与探测技术,2005,25(4):439-441. 被引量:7
  • 2王勇,牛亚芬,张丽丽.法拉第筒的安装调试[J].黑龙江水专学报,2006,33(1):94-96. 被引量:1
  • 3苏志伟,陈庆川,韩大凯.10cm×30cm矩形射频离子束源的研制[J].核技术,2006,29(10):734-737. 被引量:3
  • 4傅永庆,朱晓东,徐可为,何家文.离子束辅助沉积技术及其进展[J].材料科学与工程,1996,14(3):22-32. 被引量:17
  • 5汪泓宏 田明波.离子束表面强化[M].北京:机械工业出版社,1992..
  • 6Kuang Yuanzhu, Feng Yucai, Lou Zhiping. An Ion Source With Good Beam Current Density Uniformity for Assisted Deposition[J]. Rev Sci Instum, 1994, 65 (4):1374.
  • 7[5]J. E. Dong, L. Gannan. The influence of ion beam assisted depositon parameters on the properties of boron nitride thin films. Diamond and Related Materials, 1999,8: 1697~1702.
  • 8[7]A. Kolitsch, X. Wang. Effects of Titanium and Aluminum Incorporations on the Structure of Boron Nitride Thin Films.Diamond and Related Materials, 1999,4: 386-390.
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