摘要
介绍了用平面磁控溅射方法制备极紫外多层膜的研究工作。围绕极紫外多层膜技术 ,重点探讨了多层膜膜厚定标和工艺过程对多层膜结构和内部成分的影响。为深入研究多层膜制备工艺指明了方向。
Researches in making Extreme multilayers by magnetron sputtering are represented. For depositing multilayers, the determination of deposition speed of Mo and Si is finished. A variety of techniques are used to test the structure and composition of multilayers, including X-ray diffraction, Rutherford backscattering spectroscopy, and Auger depth profiling. The results will be directed for making high quality multilayers.
出处
《光学技术》
CAS
CSCD
2001年第6期532-534,共3页
Optical Technique
