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静电探针测量等离子体内参数 被引量:7

Measurement of Plasma Inner Parameters by Electrical Probe
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摘要 根据探针收集电子流的理论,提出电子流对探针电位的一次微商的最大值对应着等 离子体电位。以一台微型计算机作为静电探针系统的核心,统一完成探针系统的控制、记 录和计算工作。在两分钟之内可完成等离子体电位、悬浮电位、电子能量分布和电子密 度的测量。 Based on the theory of electron current collected by probe, that the maximum derivative of electron current with respect to probe potential corresponds with the plasma potential is presented. A electrical probe system is set up, in which the most important part is a microcomputer. Overall control, record and calculation are carried out only by the microcomputer. Getting the plasma potential, floating potential, energy distribution and density of electron takes no more than two minutes.
作者 冯玉国
出处 《真空》 CAS 北大核心 1990年第1期1-6,共6页 Vacuum
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  • 1李争显,张树林,袁哲,田华平.多弧离子镀中真空等离子体静电探针诊断方法的研究[J].真空,1994,31(4):25-29. 被引量:3
  • 2程仲元,邹积岩,杨磊,张汉明.朗谬尔探针用于VAC等离子体诊断的初步研究[J].应用科学学报,1996,14(4):475-480. 被引量:5
  • 3Neuhauser M ,Barwulf S,Hilgers H ,et al. Optical emission spectroscopy studies of titanium nitride sputtering on theroplastics polymers[J]. Surf. Coat. Teehnol,1999,116/119:981-985.
  • 4Eser E,Ogilvie R I,Taylor K A. Measurement of plasma discharge characteristics for sputtering applications[J]. J. Vac. Sci. Technol, 1978,15 : 199-202.
  • 5Clements R M. Plasma diagnostics with electric probes[J]. J. Vac.Sci. Technol,1978,15:193-198.
  • 6Fuchs H,Mecke H,Ellrodt H. Distribution of ion current density in a modified pulse arc process as a function of pulse parameters[J]. Surface and coatings technology, 1998,98:839-844.
  • 7Window B and Savvides N. Charged particle fluxes from planar magnetron sputtering sources[J]. J. Vac. Sci.Technol, 1986 ,Mar/Apr, A4 (2): 196-202.
  • 8邓新绿.LANGMUIR探针实验[D].大连:大连理工大学物理系,2001.
  • 9沈兰荪.智能仪器与应用[J]电子技术应用,1988(01).
  • 10池凌飞,林揆训,林璇英,余云鹏,余楚迎.等离子体的Langmuir探针诊断及数值滤波[J].真空,1999,36(6):20-24. 被引量:7

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