期刊文献+

不同剂量率LC54HC04RH电路的电离辐射效应 被引量:2

Ionization Radiation Effect on LC54HC04RH under Differential Dose Rate
在线阅读 下载PDF
导出
摘要 对 L C54HC0 4 RH电路在不同辐射剂量率进行了电离辐射实验。分析了该电路的阈值电压随辐射剂量率的变化关系。实验结果表明 :在辐射剂量率处于 3× 10 -4 Gy(Si) / s到 1.98×10 -1Gy(Si) / s范围内 ,辐射感生界面陷阱电荷随辐射剂量率的减少而增加。辐射感生界面陷阱电荷是导致该电路在空间辐射环境下失效的主要原因。 The experiment of ionization radiation effect on LC54HC04RH was performed. The threshold voltage's shift versus the dose rate was analyzed on this device. The experimental results show that the number of interface traps charge at given total dose rate decreased at dose rates from 1.98×10 -1 Gy(Si)/s to 3×10 -4 Gy(Si)/s; the interface traps charge induced by the irradiation were the main reason which induced this device failure at space environments.
出处 《固体电子学研究与进展》 CAS CSCD 北大核心 2000年第4期439-443,共5页 Research & Progress of SSE
关键词 反相器 电离辐射效应 辐射剂量率 CMOS 集成电路 inverter ionizing radiation effect the radiation dose rate the interface state
  • 相关文献

参考文献1

  • 1Ma T P,Ionizing Radiation Effects in MOS Devices and Circuits,1989年

同被引文献11

  • 1Fleetwood D M, Winokour P S, Lorence L J, et al. The Response of MOS Devices to Dose-Enhanced Low-Energy Radiation [J] . IEEE Trans. Nuc. Sci., 1985, 32 (6):4369.
  • 2Fleetwood D M, Beegle R W, Sexton F W, et al. Using a 10-keV X-Ray Source for Hardness Assurance [J] . IEEE Trans. Nucl., Sci., 1986, 33 (6): 1330.
  • 3Lelis A J, Oldham T R, Boesch H E, et al. The Nature of the Trapped Hole Annealing Process [J] . IEEE Trans.Nuc. Sci. , 1989, 36 (6): 1808.
  • 4Lelis A J, Boesch H E, Oldham T R, et al. Reversibility of Trapped Hole Annealing [J] . IEEE Trans. Nuc. Sci.,1988, 35 (6): 1186.
  • 5Fleetwood D M, Winokur P S, Schwank J R. Using Laboratory X-Ray and Cobalt-60 Irradiations to Predict CMOS Device Response in Strategic and Space Environments [J] . IEEE Trans. Nuc. Sci., 1988, 35 (6):1497.
  • 6Benedetto J M, Boesch H E Jr. The Relationship between 60Co and 10-keV X-Ray Damage in MOS Device [J] .IEEE Trans. Nuc. Sci., 1986, 33 (6): 1318-1323.
  • 7SCH L P, SCH J R. Radiation Effects on Surface Micromachined Comb Drives and Microengines [J].IEEE Trans. Nuc. Sci., 1998, 45 (6) : 2789-2798.
  • 8Knudson A R, Buchner S, McDonald P, et al. The effects of Radiation on MEMS Accelerometer [J] . IEEE Trans.Nuc. Sci., 1996, 43 (6): 3122-3126.
  • 9郭旗,陆妩,余学锋,任迪远,严荣良.高速CMOS电路电离辐照损伤的剂量率效应[J].核技术,1998,21(8):503-506. 被引量:6
  • 10张正选,罗晋生,袁仁峰,何宝平,姜景和.不同辐射剂量率下CMOS器件的电离辐射性能[J].Journal of Semiconductors,1999,20(8):682-687. 被引量:5

引证文献2

二级引证文献13

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部