摘要
通过改变磁控溅射过程中氩气与氮气(Ar/N2)的分压比,制备了多种不同厚度的Si90Al10Nx薄膜样品,并采用透射率轮廓法对样品在热处理前后的光学性能(包括折射率和消光系数)进行了测量和分析。结果表明,样品的光学性能可通过调整Ar/N2的流量比、薄膜厚度、退火条件等工艺参数加以控制。
Various SioAll0Nx films with different thicknesses were prepared by changing argon/nitrogen （Ar/N2） flow ratio in magnetron sputtering process. The fihn optical properties, including refractive index and extinction coefficient, before and afler annealing were measured and analyzed by transmittance profile method. It is found that the optical properties of the films can be well controlled by changing various process parameters such as Ar/N2 flow ratio, film thickness and annealing condition.
出处
《真空》
CAS
2013年第4期22-25,共4页
Vacuum
基金
国家自然科学基金项目(No.11204283)
关键词
磁控溅射
工艺研究
折射率
消光系数
分压比
magnetron sputtering
technical study
refractive index
extinction coefficient
partial pressure ratio
