摘要
介绍了几种常用的晶圆金属铝膜腐蚀工艺,并详细讲解了全自动单晶圆铝腐蚀清洗机采用第四种工艺配方进行金属铝膜腐蚀清洗的工艺过程。同时,简单介绍了为提高腐蚀清洗效果而设计的两套子系统的工作原理。
Several aluminum corrosion processes are introduced. With one of the processes, the operating of the automatic aluminum corrosion and cleaning equipment is present.. The principle of temperature control system and acid recycle system is also introduced.
出处
《电子工业专用设备》
2013年第6期1-4,31,共5页
Equipment for Electronic Products Manufacturing
关键词
半导体
铝腐蚀
单晶圆清洗
自动设备
Semiconductor
Aluminum corrosion
Single wafer clean
Automatic equipment
