摘要
为了更好地理解和认识刻蚀机理,并为制造工艺提供优化指导,采用三维元胞模型研究了刻蚀工艺的表面演化过程,并着重探讨了离子对表面演化过程的影响.针对刻蚀离子入射角度的求解问题,提出了一种降维分量拟合方法,将一个三维曲面拟合问题转化为两个二维曲线拟合进行求解,对入射点的表面法向量计算实现了快速求解,与采用最小二乘多项式曲面拟合求解离子入射角度相比,其计算精度和效率都有较大的提高;对用于拟合计算的表面元胞的选取方法进行了改进,提高了拟合的准确度.将这种方法应用到硅刻蚀工艺三维仿真中,其模拟结果与相关实验结果对比,验证了该方法对刻蚀工艺描述的有效性.
In order to get a better understanding of etching mechanism and provide optimization guidance for manufacturing process,a three-dimensional（3D）profile evolution simulator based on cellular model is developed to investigate the surface evolution of etching process,and discuss emphatically the effect of ions on the surface evolution.According to the solving problem for angle of ion incidence,a component fitting-based dimension reduction method is presented to convert a 3D surface fitting problem into a twodimensional（2D）curve fitting problem,and achieve fast solution for the surface normal vector of the incident point.Compared with least squares polynomial fitting method,this method improves computational accuracy and efficiency of the ion incidence angle.The improvement on the accuracy of fitting is achieved by improving the selection method of surface cellular for fitting.The fitting method is applied to 3D simulation of silicon etching process,and the simulation results verify the simulated surface by comparing with relevant experimental results.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2013年第10期419-427,共9页
Acta Physica Sinica
基金
国家科技重大专项(批准号:2011ZX2403-002)资助的课题~~
关键词
刻蚀
三维元胞模型
表面演化算法
降维分量拟合
etching
three-dimensional cellular model
surface evolution algorithm
component fitting-based dimension reduction method
