摘要
接触孔是碲镉汞红外探测器引出光敏元信号的电极所附着的区域,其形状尺寸均匀性对探测器性能有重要影响。随着探测器芯片感光像元间距的减小,高深宽比光刻图形加工得到的接触孔均匀性下降。本文提出了使用金属层作掩膜,通过薄胶光刻、薄胶刻蚀的方法,制备出了均匀性高、孔底形貌好的接触孔,接触孔非均匀性从光刻胶掩膜的11.54%降低到了金属掩膜的5.98%,突破了小间距碲镉汞芯片均匀性较差的难题,对探测器信号均匀性的提升具有参考意义。
Contact holes are the regions where electrodes for extracting signals from photosensitive elements of mercury cadmium telluride(MCT)infrared detectors are attached,and the uniformity of their shape and dimensions significantly impacts detector performance.The uniformity achieved by high depth-to-width ratio photolithographic patterning decreases as the distance between the photosensitive elements on the detector chip decreases.In this paper,a method is proposed in which a metal layer is employed as a mask to fabricate contact holes with high uniformity and desirable bottom morphology by thin resist lithography and thin resist etching.The non-uniformity of the contact hole is reduced from 11.54%of the photoresist mask to 5.98%of the metal mask.This approach overcomes the challenge of poor uniformity of the small-pitch HgCdTe chips,which is of reference significance for enhancing the uniformity of the detector signals.
作者
赵泽人
陈书真
杨茂生
王丛
ZHAO Ze-ren;CHEN Shu-zhen;YANG Mao-sheng;WANG Cong(North China Research Institute of Electro-Optics,Beijing 100015 China)
出处
《激光与红外》
北大核心
2025年第7期1055-1058,共4页
Laser & Infrared
关键词
碲镉汞
接触孔
金属掩膜
Mercury-Cadmium-Telluride
contact hole
metal mask
