摘要
采用显微硬度测试方法,研究在单晶硅衬底上沉积厚度仅为0.09-0.56μm的磁控溅射类金刚石碳膜的力学性能。结果表明,溅射碳膜的硬度随溅射工艺参数呈规律性变化,且可以和碳膜的类金刚石性质以及碳膜结构的SP^3和SP^2成分的变化相联系。采用Johnson复合硬度模型进行的分析表明,溅射碳膜的真实硬度在HV6000-6600之间,比天然金刚石的硬度略低。溅射类金刚石碳膜具有明显的压痕尺寸效应(ISE),其指数约为m=1.9。
Conventional microhardness test were employed to characterize the mechanical properties of magnetron sputtered diamond-like carbon thin films of thickness of 0.09-0.56 mirons. It was found that microhardness of magnetron sputtered DLC varies with sputtering parameters in a systematic way and it can be related to the diamond-like properties and the component of SP2 and SP3 structures of the DLC. Analysis from DLC of 0.3073μm which were simu-taneously sputtered onto stainless steel and single crystal silicon substrate at 200W showed that the true hardness of the DLC was ranging between HV 6000-6600, which is close to the hardness of natural diamond. Pronounced indentation size effect (ISE) was observed, and the ISE index of 1.9 for the DLC was obluined.
出处
《北京科技大学学报》
EI
CAS
CSCD
北大核心
1991年第6期548-553,共6页
Journal of University of Science and Technology Beijing
基金
国家高技术计划项目
关键词
显微硬度
类金刚石
薄膜
碳膜
溅射
microhardness, thin film, diamond-like carbon film, true hardness, indentation size effect
