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多弧离子镀Ti-N镀膜的扩散屏障作用 被引量:2

ROLE OF MULTI-ARC PLATED Ti-N FILM AS A DIFFUSION BARRIER
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摘要 设计了3种复合镀层系,研究了多弧离子镀Ti-N镀膜对Al,Ni,Co的扩散屏障作用及Ti-N镀膜在1000和1100℃长期时效时的热稳定化结果表明,在1000℃以下时效时,Ti-N镀膜稳定性良好,并可有效地阻止Al向基材扩散,可减缓、阻止Ni,Co在CoCrAlTaY涂层与基体间的互扩散行为;在1100℃时效时,Ti-N镀膜未分解,也不与基材及CoCrAlTaY涂层间发生互扩散,但组织形态由薄膜变为颗粒状,颗粒状Ti-N无法阻止Ni,Co在CoCrAlTaY涂层与基材间的互扩散. Several multi-layer coatings have been designed so as to assess the diffusion barriering ability against Al,Ni,Co,etc.as well as the high temperature stability of the multi-arc plated Ti-N film after being aged at 1000 and 1100℃ for a long time.The results show that,up to 1000℃,Ti-N film is of good stability;it can prevent effectively Al from diffusing towards matrix,and slow down the rate of diffusion of Ni,Co from CoCrAlTaY to matrix.Above 1100℃,the morphology of Ti-N film changes from thin foil to particles.Apparently the particle-shaped Ti-N can not prevent Ni,Co from the inter-diffusing between matrix and CoCrAlTaY coating.
机构地区 清华大学
出处 《金属学报》 SCIE EI CAS CSCD 北大核心 1994年第2期B077-B081,共5页 Acta Metallurgica Sinica
关键词 包覆型涂层 扩散屏障 钛氮镀层 overlaying coating,diffusion-barrier coating,inter diffusion effect,Ti-N coating
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  • 1吕反修,1989年
  • 2吕反修,薄膜科学与技术,1989年,3期,1页
  • 3Tsai Hsiaochu,J Vac Sci Technol,1988年,A6卷,2307页
  • 4Tsai Hsiaochu,J Vac Sci Technol,1987年,A5卷,3287页

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