摘要
采用脉冲激光沉积法(PLD)在不同温度单晶硅基底上制备了WSx固体润滑薄膜.利用扫描电子显微镜(SEM)、X射线能谱仪(EDS)、X射线衍射仪(XRD)对薄膜的成分、形貌和微观结构进行了分析,采用球-盘式磨损试验机测试了薄膜在大气环境下(相对湿度50%～60%)的摩擦学特性.结果表明:室温下所获得的薄膜为微晶结构;在RT～300℃范围内,随着温度的升高,薄膜表面趋于光滑、致密,且形成晶态WSx的趋势逐渐增大,薄膜与基底间的结合力增大,但薄膜中S和W的含量之比(S/W比)从1.84逐步下降到1.49.薄膜的摩擦系数在RT～200℃范围内与其S/W比呈反比关系,在300℃条件下,薄膜中形成了大量的WS2晶体,摩擦系数最低且耐磨性能也最好.
WSx solid lubrication films were deposited on monocrystalline silicon substrates at various temperatures by pulsed laser deposition. The composition, morphology and microstructure of the films were characterized by scanning electron microscopy, energy dispersive X - ray spectroscopy and X - ray diffractometer respectively. The tribological behavior of the films were investigated using a ball - on - disk tribometer in atmosphere （ relative hmnidity 50% to 60% ）. The results show that the film deposited under room temperature was of crystallite structure. As rising the substrate temperature from room temperature to 300 ℃, the surface of the film became smoother and more compact, and the bonding strength between film and substrate and the crystallinity degree of WSx phase increased. However, the atom fraction ratio of sulfur to tungsten of the film （ S/W ratio） decreased from 1.84 to 1.49. The friction coefficient was inversely correlated with the S/W ratio in the substrate temperature range of RT - 200 ℃. A great amount of crystalline WS2 was formed within the film at a substrate temperature of 300 ℃, and the film exhibited the lowest friction coefficient and excellent wear resistance.
出处
《摩擦学学报》
EI
CAS
CSCD
北大核心
2012年第6期612-618,共7页
Tribology
基金
浙江省自然科学基金项目(Y4110645)资助~~
关键词
薄膜
WS2
脉冲激光沉积
基底温度
固体润滑
thin film, WS2 , pulsed laser deposition, substrate temperature, solid lubrication
