摘要
用磁控反应溅射的方法在不锈钢基片上制备了NbN／TaN纳米多层薄膜，试验采用X射线衍射仪（XRD）、透射电子显微镜（TEM）及显微硬度仪对薄膜的微结构和硬度进行分析，结果表明：在NbN／TaN多层膜中，NbN层为面心晶体结构，TaN层为六方晶体结构；NbN／TaN纳米多层膜存在超硬效应，在调制周期2．3～170nm这一放宽的范围内保持超高硬度，硬度最大值HK达51.
The polycrystalline NbN/TaN nano-multilayer films were grown on the substrates of stainless steel by reactive magnetron sputtering. The microstructures and microhardness of the nano-multilayer films were studied by X-ray diffraction (XRD), transmission electron microscopy (TEM) and microhardness tester. The results show that the NbN layers are cubic crystal structure and TaN layers are hexagonal in the NbN/TaN multilayer films. NbN/TaN nano-multilayer films have superhardness effects with a modulation period from 2.3nm to 17.0nm. The maximum hardness HK is 51.0GPa.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
2000年第3期561-564,共4页
Journal of Inorganic Materials
