摘要
通过磁控反应溅射仪制备了ＴａＮ／ＴｉＮ和ＴａＷＮ／ＴｉＮ多晶超晶格薄膜，采用Ｘ射线衍射仪（ＸＲＤ）、透射电子显微镜和显微硬度仪对超晶格薄膜的微结构和硬度进行了分析结果表明，ＴａＮ／ＴｉＮ和ＴａＷＮ／ＴｉＮ二超晶格体系中各组成材料的晶体结构均为面心立方，呈多晶外延生长模式，从而形成共格界面，产生协调应变ＴａＮ／ＴｉＮ和ＴａＷＮ／ＴｉＮ超晶格薄膜都存在超硬效应，分别在调制周期９．０和５．６ｎｍ时取得相应的最大硬度值ＨＫ＝４０．０和５０．０ＧＰａ．研究认为不同的晶格错配度影响薄膜的硬度以及硬度峰值的位置。
The polycrystalline TaN/TiN and TaWN/TiN superlattice films have been grown byreactive magnetron sputtering. The microstructures and microhardness of the superlattice films havebeen studied with X-ray diffraction (XRD), transmission electron microscopy (TEM) and microhardnesstester. The results show that the crystal structure of the component materials in TaN/TiN and TaWN/TiNsuperlattice films are faced-center cubic (FCC) and have a epitaxially grown mode of polycrystallinity. Thecoherent strain has been produced due to the coherent interfaces. TaN/TiN and TaWN/TiN superlatticefilms all have superhardness effect and have hardness maximum values HK=40.0 and 50.0 GPa with amodulation period at 9.0 and 5.6 nm respectively. The authors have proposed that the lattice mismatchaffect the microhardness value and the peak position where hardness gets its maximum. The main reasoncausing hardness anomalies is the inhibition of dislocation motion by alternating stress fields of interfacial coherent strain.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
1999年第11期1214-1218,共5页
Acta Metallurgica Sinica
关键词
超晶格薄膜
晶格错配度
超硬效应
多晶
薄膜
TaN/TiN, TaWN/TiN, superlattice film, lattice mismatch, superhardness effect
