摘要
VO2是一种新型材料,在68℃左右可发生低温半导体与高温金属相之间的可逆相变。综述了VO2薄膜的基本性能,介绍几种常用的VO2薄膜制备方法,对VO2薄膜的应用以及VO2薄膜相变温度的控制方面的研究进展进行探讨;对VO2薄膜的不同应用方向、未来发展趋势及研究重点进行展望。
VO2 is a new functional material, and it has a reversible transition between low-temperature semiconductor phase and high-temperature metal phase at about 68 ℃. This paper briefly reviews the basic properties, and introduces several common preparation methods of VO/thin films. The research progress of the application and the control of phase transition temperature for VO： thin films are discussed. Furthermore, different application direction, the development tendency and research emphases of VO2 thin film are prospected.
出处
《兵器材料科学与工程》
CAS
CSCD
北大核心
2012年第4期109-112,共4页
Ordnance Material Science and Engineering
关键词
VO2薄膜
制备方法
相变温度
VO2 thin film
preparation methods
phase transition temperature
