摘要
利用乙二胺(Ethylenediamine anhydrous,EDA)/异丙醇(Isopropyl alcohol,IPA)体系对单晶硅(100)面进行了各向异性腐蚀,研究了不同温度、不同反应时间条件下单晶硅表面的绒面结构和表面反射率。利用EDA/IPA体系得到的金字塔结构尺寸为8μm左右,但均匀性较差。在1.5%EDA、5%IPA体系中添加5%Na2SiO3,80℃反应15min后获得了平均反射率为11%、表面金字塔结构均匀且尺寸较小的单晶硅绒面。实验结果表明,Na2SiO3的引入使金字塔的尺寸从8μm左右降低至3μm左右,并且均匀度也得到改善。
The texture monocrystalline silicon was prepared with ethylenediamine anhydrous（EDA）/isopropyl alcohol（IPA） as escharotics. The dependence of the surface reflectance and topography on different parameters （con centration, reaction time, temperature） was researched. The result demonstrated that using EDA/IPA solution obtain small size. The surface texturization is optimized in condition of 1.5% EDA, 5% IPA, etching 15rain at 80℃, with 5 % Na2 SiO3 as additive. Under this optimized condition, the surface is led to an average reflectance Of 11%. As a resuit, a small amount of Na2SiO3 added in EDA/IPA solution helps to reduce the pyramidal size from 8μm to 3μm approximately and obtain more uniform surface.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2012年第12期16-18,21,共4页
Materials Reports
基金
国家自然科学基金(21171072)
广东省自然科学基金(9151063201000018)
关键词
硅制绒
乙二胺
各向异性腐蚀
太阳能电池
silicon texturing, EDA, anisotropic etching, solar energy cells
