摘要
利用大气压低温等离子体射流技术,以空气为放电气体,四氯化钛为钛源,在玻璃载玻片基底上制备了二氧化钛薄膜。利用扫描电镜及椭圆偏振仪分析测量了薄膜的表面形貌与沉积速率。利用紫外光照射硬脂酸分解速率评价所制备薄膜的光催化活性,结果显示在同一放电输入功率及气体流量条件下,四氯化钛前驱体引入位置距射流枪枪口越近,所制备的二氧化钛薄膜光催化性能越高。在同一反应位置时,放电输入功率的增加有助于提高二氧化钛薄膜的光催化活性。
The titanium dioxide films were deposited on glass substrates with plasma jet under ambient conditions.The impacts of the growth conditions,such as the Ti source material,gas flow rate,plasma power,deposition rate,orientation and distance of the nozzle,on the film growth were studied.The microstructures of the TiO2 films were characterized with scanning electron microscopy,Raman spectroscopy,ellipsometry,and Fourier transform infrared spectroscopy.The decomposition rates of the stearic acid layers under irradiation of ultra violet light were evaluated to test its photocatalystic property.The control test results show that the distance between the nozzle and TiCl4 precursor beam strongly affects its photocatalystic activity.Moreover,an increase of the plasma power enhances the activity.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2012年第1期1-5,共5页
Chinese Journal of Vacuum Science and Technology
基金
北京市教育委员会科技计划面上项目(No.KM201010015005)
北京市优秀人才培养计划资助项目(No.2010D005004000001)
关键词
等离子体射流
二氧化钛
光催化
薄膜
Plasma jet
Titanium dioxide
Photocatalysis
Thin film
