摘要
采用直流磁控溅射技术制备了厚度约100nm的W,WSi2,Si单层膜和周期约为20nm,Si膜层厚度与周期的比值为0.5的W/Si,WSi2/Si周期多层膜。利用台阶仪对镀膜前后基底表面的面形进行了测试,计算并比较了不同膜系的应力值。结果表明:W单层膜表现出较大的压应力,而W/Si周期膜则表现为张应力。WSi2单层膜和WSi2/Si周期多层膜均表现为压应力,没有应力突变,应力特性最为稳定。因此,WSi2/Si材料组合是研制大膜对数X射线多层膜较好的材料组合。
A series of W,WSi2,Si thin films and W/Si,WSi2/Si periodic multilayers were fabricated by using DC magnetron sputtering technology.Surface profiles before and after deposition were measured with a stylus profiler and the stresses were calculated.The results indicate that W thin films show relatively large compressive stress,while W/Si multilayers show tensile stress.Both WSi2 thin films and WSi2/Si periodic multilayers show compressive stress.WSi2/Si periodic multilayers have the most stable stress state with no sharp change,and is a good material combination for X-ray multilayer optics with a large number of bilayers.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2011年第6期1659-1662,共4页
High Power Laser and Particle Beams
基金
国家自然科学基金项目(10773007,10704056)
科技部国际交流与合作专项项目(2008DFA01920)
关键词
应力
形变
多层膜
磁控溅射
X射线
stress
deformation
multilayer
magnetron sputtering
X-ray
