摘要
用射频磁控溅射法制备了Al-F共掺杂ZnO(ZnO(Al,F))透明导电薄膜,研究了不同退火气氛对ZnO(Al,F)薄膜的结构、电学和光学特性的影响。结果表明:在真空和还原性气氛中退火后的薄膜透光率呈现'蓝移'趋势,在空气中退火处理后的薄膜透光率则表现为'红移';在真空中,400℃×60min的退火处理,使ZnO(Al,F)薄膜的电阻率降低至1.41×10^(-3)Ω·cm,透光率则上升到93%以上,有效提高了薄膜的光电特性;所有退火气氛下,薄膜均具有(002)单一择优取向的多晶六方纤锌矿结构;薄膜的晶粒尺寸为25～30nm。
ZnO： （Al, F） thin films have been prepared on glass substrates by RF magnetmn sputtering. The structural, electrical and optical properties of the deposited films were strongly influenced by different ambiences during the heat treatment. ＂Blue shift＂ of transmission of ZnO： （AI, F） films occured when they were annealed in vacuum and reductive atmosphere, respectively, while ＂red shift＂ was observed after annealing in the air. The lowest resistivity of the film is reduced to 1.41 × 10^-3 Ω· cm and the high optical transmittance is increased to 91.5% when it was annealed in vacuum with a temperature of 400℃ for 60min. All deposited films demonstrate a c-axis preferred orientation of （002） with grain size ranging from 25 to 30nm.
出处
《太阳能学报》
EI
CAS
CSCD
北大核心
2011年第1期49-53,共5页
Acta Energiae Solaris Sinica
