摘要
采用无机盐溶胶-凝胶方法在载玻片衬底上制备了ZnO:Al薄膜,利用X射线衍射(XRD)、紫外-可见光透射光谱(UV-Vis transmittance spectrum)和扫描电镜(SEM)研究了退火温度和Al3+掺杂浓度对ZnO:Al薄膜结构和光学性能的影响。结果表明,随退火温度的升高或进行适当浓度的Al3+掺杂,可使(002)衍射峰的强度增强,晶粒尺寸增大,半高宽减小,薄膜的结晶质量明显改善,且可见光透过率高。
ZnO：A1 thin films were prepared on the glass substrates by the Sol-Gel method. The effects of different A1^3＋ dopant concentration and the annealing temperature on the structural and optical properties of ZnO：A1 films were studied by using X-ray diffraction（XRD）, UV-Vis transmittance spectrum and scanning electron microscope .The results indicated that the ZnO：A1 thin films have a preferred c-axis （002） orientation perpendicular to the substrates, With increasing the annealing temperature or adding proper A1^3＋ dopant concentration ,the intensities of the XRD diffraction peaks and the grain size increased, while the values of FWHM decreased. The thin films also have the high visible transmittance of 〉80%. It was demonstrated that the high quality ZnO：A1 films can be prepared by properly controlling the annealing temperature and the A1^3＋ dopant concentration.
出处
《红外技术》
CSCD
北大核心
2011年第2期80-84,共5页
Infrared Technology
基金
兵器支撑项目
