摘要
采用化学气相沉积(CVD)法制备高纯钛。以经典的成核理论为依据,对钛在沉积基体上的成核过程进行热力学和动力学分析,计算出成核过程吉布斯自由能ΔGmax、成核速率v和临界晶核直径D0的数学方程;并且考察了影响钛沉积速率的因素,结果表明:卤化区的温度、分解区的温度、低价碘化物和高价碘化物的蒸汽压都对钛的沉积速率有一定的影响,其中两区的温度对钛的沉积速率影响较大。
High-purity titanium was prepared via CVD（chemical vapor deposition） process.Based on the classical nucleation theory,the nucleation process of the titanium deposited on substrate was investigated thermodynamically and kinetically.Some relevant equations were thus derived,ie.,the Gibbs free energy（ΔGmax）,nucleation rate（v） and critical crystal nucleus diameter（D0）,and the influencing factors on the deposition rate of the titanium were discussed.The results showed that the halogenated area temperature,decomposed area temperature and the vapor pressures of low-valent iodide and high-valent iodide all have influence on the deposition rate of high-purity titanium,especially the temperature in halogenated and decomposited areas.
出处
《真空》
CAS
北大核心
2011年第1期46-50,共5页
Vacuum
关键词
CVD
高纯钛
成核
热力学
动力学
CVD
high-purity titanium
nucleation
thermodynamics
kinetics
