摘要
对采用TiCl4-CH4-H2反应体系化学气相沉积碳化钛的反应热力学和成核热力学因素进行了分析,并在实验的基础上研究了不同沉积温度下化学气相沉积TiC过程的动力学特征,以及在不同的动力学控制机制下气相过饱和度和成核过程对TiC涂层的析出形态的影响。在沉积过程中,气相过饱和度和动力学控制机制是控制沉积物的成核过程和析出形态的决定因素。
Thermodynamic analyses for chemical vapor deposition(CVD) process of TiC from TiCl 4 CH 4 H 2 system was made The kinetic characteristics of TiC CVD process at different deposition temperature, and the effects of the supersaturation of the vapor and the nucleation processes on the deposition morphology of TiC coating in different type of kinetic mechanism have been studied The supersaturation of the vapor and the type of kinetic process involved in the deposition of TiC coating are determining factors for the control of their nucleation and morphology
出处
《材料工程》
EI
CAS
CSCD
北大核心
1998年第10期25-29,共5页
Journal of Materials Engineering