摘要
本文主要对光化学蚀刻实验线的一些问题进行了研究。测定了曝光机的光密度均匀区数据以及曝光图形线宽分布数据，为实验线提供了保证曝光质量的定量依据。还测定了实验线所用工业三氯化铁溶液的自由酸度，研究了蚀刻性能与自由酸度的关系，给出了能获得较好蚀刻质量的蚀刻液自由酸含量范围。并且通过实验线试作了引线框架，试作结果表明影响蚀刻质量的因素是多方面的，尤其需注意因模板面积不同而造成的蚀刻特性的变化对尺寸精度产生的影响。
Some issues of a photoetching production line in the laboratory have been studied here.The uniformity diagram for light energy density and the line width distribution through the exposuring area of the printer were obtained to offer aquantitative guideline to good and stable exposure quality.The panel size for+/-10 μm dimension tolerance is 170×130mm.A few methods to measure the acidity of FeCl 3 solution on etching behavior of FeCl 3 solution were compared and the most effective one was presented.Effect of.free acidity of the FeCl 3 solution on etching behavior of Ferric Nickel alloy was also investigated.It is found that for the commercial FeCl 3 solution of 40 Baume degree,the optimal pH is over 0 35.0n the basis of the experimental results of the etching performance of Kovar and Ferric Nickel alloy,244Pin lead frame was fabricated in precision is affected by a few factors,especially the panel size.
出处
《山东陶瓷》
CAS
1999年第2期42-47,共6页
Shandong Ceramics
