摘要
Kretschmann型激发表面等离子体共振(SPR)膜系结构是探针诱导表面等离子体共振耦合纳米光刻技术(PSPRN)的关键部分之一。采用多层介质的特性矩阵法计算膜系结构的透射系数和反射率,对PSPRN所需的单膜层、双膜层及三膜层膜系结构进行了优化设计。计算结果表明,光波波长为514.5 nm时,对于选定材料的最佳膜系结构是Ag膜厚度为46 nm的单膜层结构,Ag膜厚度为24 nm,AgOx厚度为95 nm的双膜层结构及Ag膜厚度为44 nm,SiO2厚度为180 nm,AgOx厚度为10 nm的三膜层结构,提出了记录层材料应选择折射系数小且吸收系数尽可能小的光刻材料的观点。
Kretschmann surface plasmon resonance（SPR） films structure is one of the most important parts of probe induced surface plasmon resonance coupling nanolithography（PSPRN）.The film characteristic matrix method is used to calculate the transmission coefficient and the reflectivity of the layers for optimal design of single-,two-or three-films structure of PSPRN.Optimal results for the selected film materials are obtained at the wavelength of 514.5 nm.For single film structure,the optimal thickness of Ag film is 46 nm.The optimal thickness of the Ag film is 24 nm and the AgOx film is 95 nm for two-film structure.For three-film structure,the optimal result is that the thickness of Ag film is 44 nm,SiO2 film is 180 nm,and AgOx film is 10 nm.Furthermore,it is presented that the material with small refractive index and low Absorption coefficient is more effective as the recording layer.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2010年第7期2164-2169,共6页
Acta Optica Sinica
基金
国家自然科学基金重大项目(60490294)
上海曙光计划(06SG30)资助课题
关键词
薄膜光学
表面等离子体共振膜系结构
特性矩阵法
透射系数
反射率
thin films optics
surface plasmon resonance films structure
characteristic matrix method
transmission coefficient
reflectivity
