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AlGaSb/GaSb quantum wells grown on an optimized AlSb nucleation layer

AlGaSb/GaSb quantum wells grown on an optimized AlSb nucleation layer
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摘要 Five-period AlGaSb/GaSb multiple quantum wells(MQW) are grown on a GaSb buffer.Through optimizing the AlSb nucleation layer,the low threading dislocation density of the MQW is found to be(2.50±0.91)×10~8 cm^(-2) in 1-μm GaSb buffer,as determined by plan-view transmission election microscopy(TEM) images.High resolution TEM clearly shows the presence of 90°misfit dislocations with an average spacing of 5.4 nm at the AlSb/GaAs interface,which effectively relieve most of the strain energy.In the temperature range from T = 26 K to 300 K,photoluminescence of the MQW is dominated by the ground state electron to ground state heavy hole(el-hhl) transition, while a high energy shoulder clearly seen at T76 K can be attributed to the ground state electron to ground state light hole(el-lhl) transition. Five-period AlGaSb/GaSb multiple quantum wells(MQW) are grown on a GaSb buffer.Through optimizing the AlSb nucleation layer,the low threading dislocation density of the MQW is found to be(2.50±0.91)×10~8 cm^(-2) in 1-μm GaSb buffer,as determined by plan-view transmission election microscopy(TEM) images.High resolution TEM clearly shows the presence of 90°misfit dislocations with an average spacing of 5.4 nm at the AlSb/GaAs interface,which effectively relieve most of the strain energy.In the temperature range from T = 26 K to 300 K,photoluminescence of the MQW is dominated by the ground state electron to ground state heavy hole(el-hhl) transition, while a high energy shoulder clearly seen at T76 K can be attributed to the ground state electron to ground state light hole(el-lhl) transition.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第5期30-34,共5页 半导体学报(英文版)
基金 supported by the National Natural Science Foundation of China(No.50572120) the National High Technology Research and Development Program of China(No.2009AA033101) the State Key Development for Basic Research of China(No.2010CB327501).
关键词 molecular beam epitaxy ANTIMONIDE semiconductingⅢ-Ⅴmaterial molecular beam epitaxy antimonide semiconductingⅢ-Ⅴmaterial
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