摘要
介绍一种用于亚微米曝光系统的柔性铰链调焦机构，讨论了其设计与计算方法，这种机构得到了２０ｎｍ的分辨力、２００μｍ的行程和小于１弧秒的导向精度。这是一种适合纳米定位的理想机构。
A flexible hinge focusing mechanism for sub micron exposure system is introduced in the paper.Its design and calculation method are discussed.This mechanism has a resolution of 20nm,200μm stroke and less than 1″ guide accuracy.This is an ideal mechanism which is suitable for nanometer positioning.
出处
《光电工程》
CAS
CSCD
1998年第3期23-26,共4页
Opto-Electronic Engineering
基金
中国科学院"八五"重大项目
关键词
分步重复光刻机
调焦机构
铰链
光刻机
Step and repeat photoetching machines,Focusing mechanisms,Hinges.
