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Pr掺杂ZnTe薄膜的结构及光学特性 被引量:1

Structure and optical properties of Pr-doped ZnTe thin film
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摘要 利用真空蒸发的方法制备ZnTe多晶薄膜,并采用双源法对薄膜进行了稀土元素Pr的掺杂。用XRD、紫外可见分光光度仪、冷热探针对薄膜的性质进行了表征。结果表明,当原子配比Zn∶Te=1∶0.7,热处理温度T=500℃时,可制备较理想的ZnTe多晶薄膜。稀土Pr掺杂并未改变样品的物相结构,但使薄膜光吸收增大而光学带隙增大。 The ZnTe polycrystalline thin films were prepared by double-source vacuum evaporation on glass substrate with the RE element Pr doped. The optical properties of the films were characterized by visible ultraviolet spectropbotometry, XRD and cold/hot probe. The result showed that the optical properties of ZnTe thin films are best when Zn :Te =1:0.7 and annealed at 500℃. As to the "Pr-doping effect, it doesn't change the phase structure of the film sample but increases its solar absorbency with optical band gap widened.
出处 《真空》 CAS 北大核心 2009年第6期55-58,共4页 Vacuum
关键词 ZnTe薄膜:光学特性 真空蒸发 稀土掺杂 ZnTe thin film optical property vacuum evaporation RE element doping
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  • 1李蓉萍,荣利霞.真空蒸发制备ZnTe薄膜性能[J].太阳能学报,2002,23(3):293-297. 被引量:5
  • 2Chemam R,Grob J J, Bouabellou A et al. ZnTe precipitates formed in SiO2 by sequential implantation of Zn^+ and Te^+ ions[J].CatalysisToday,2006,113(3-4) :215-219.
  • 3Khenata R,Bouhemadou A,electronic and optical properties of ZnS,ZnSe and ZnTe under pressure [J]. Computational Materials Science,2006,38 (1):29-38.
  • 4Acharya K P, Erlacher A and Ullrich B. Responsivity properties of ZnTe/GaAs heterostructures formed with pulsed-laser deposition [J]. Solar Energy Materials and Solar Cells,2009,93 ( 1 ) :25-27.
  • 5Murali K R, Ziaudeen M and Jayaprakash N. Structural and electrical properties of brush plated ZnTe films [J] . Solid-State Electronics, 2006, 50(11-12) : 1692-1695.
  • 6Khawaja E E, Daous M A, Durrani S M et al. Chemical inhomogeneity in zinc telluride thin films prepared by thermal evaporation[J] . Thin Solid Films ,2005, 485( 1-2): 16-21.
  • 7Katsuhiko Saito, Tetsuo Yamashita, Daisuke Kouno et al. Growth characteristics ZnMgTe layer on ZnTe substrate by metalorganic vapor phase epitaxy [J] . Journal of Crystal Growth, 2007, 298:449-452.
  • 8Kale S S, Mane R S, Pathan H M et al. Preparation and characterization of ZnTe thin films by SILAR method [J]. Applied Surface Science, 2007,253(9):4335-4337.
  • 9Onodera A,Ohtani A,Tsudukiand S et al.Synchrotron X-ray diffraction study of ZnTeat high pressure [J]. Solid State Communications, 2008,145(7-8):374-378.
  • 10徐自强,邓宏,谢娟,李燕.掺Al对ZnO薄膜结构和光电性能的影响[J].液晶与显示,2005,20(6):503-507. 被引量:9

二级参考文献8

  • 1邓宏,B.GONG,A.J.Petrella,J.J.Russell,R.N.Lamb.Characterization of the ZnO thin film prepared by single source chemical vapor deposition under low vacuum condition[J].Science China(Technological Sciences),2003,46(4):355-360. 被引量:8
  • 2杨田林,韩圣浩,张鹏,王爱芳.有机衬底和玻璃衬底ZnO:Al透明导电膜的结构及光电特性对比研究[J].液晶与显示,2004,19(5):329-333. 被引量:5
  • 3[1]Buch F, Fahrenbruch A L,Bube R H. Photovoltaic prop erties of n-CdSe/p-ZnTe heterojunction [ J ]. Appl PhysLett 1976,28(1) :593.
  • 4[2]Buch F, Fahrenbruch A L, Bube R H. Photovoltaic properties of five Ⅱ - VI heterojuntions [ J ]. J Appl Phys, 1977, 48(5): 1596.
  • 5[3]Nishio M, Enoki T, Mitsuishi Y. Homoepitaxial groeth of ZnTe by synchrotron raditation using metalorganic sources[ J ]. Thin Soid Films, 1999,343-344: 504.
  • 6[4]Nishio M, Guo Q, Ogawa H. Ohmic contacts to p-type ZnTe using electoless Pd [J]. Thin Solid Films, 1999,343-344: 508.
  • 7[5]Meyers P V. Polycrystalline thin film CdTe n-i-p solar cells[R]. Final Subcontract Rep September 1988-August 1989, Contract DE-AC02-83CH1009, US Departmint ofenergy, Washongton, DC.
  • 8[6]Lee D,Zucker J E, Johnso A M, Austin R F. Room-tem perature excitonic saturation in CdZnTe/ZnTe guantum well [ J ]. Appl Phys lett, 1990,57 ( 11 ): 1132.

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