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离心涂胶过程的参数变化分析与模拟 被引量:2

Dynamic Analysis of Spin Coating
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摘要 用流体力学理论分析了IC制造技术中离心式涂胶过程胶液的受力流动状态,推导出反映涂胶厚度与离心机转速、胶液粘度等参数变化规律的数学模型,并通过此数学模型对离心涂胶过程的参数变化进行计算机模拟。经实际涂胶测定,该模型反映的变化规律与实际是相符的。 Flowing form of resist forced by centrifugal during process of spin coating used in IC manufacture is analyzed in this paper. Relationship among parameters of rotating speed, viscosity & coated resist thickness have been deduced in the view of liquid dynamics. Measured by practical spin coating and experiment, the changing rule reflected by the theoretical results is coincide well with the measuring data.
出处 《光学精密工程》 EI CAS CSCD 1998年第4期75-80,共6页 Optics and Precision Engineering
关键词 离心式涂胶 胶膜厚度 胶粘粘度 光刻 Spin coating, Liquid dynamics, Resist thickness, Viscosity
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参考文献2

  • 1团体著者,工程流体力学,1987年,150页
  • 2王焕德,流体力学和流体机械,1981年,80页

同被引文献14

  • 1冯晓国,方梁,孙连春.金属网栅结构参数设计与制作[J].光学精密工程,2005,13(1):59-64. 被引量:24
  • 2付永启,赵晶丽.离心式涂胶膜厚均匀性的影响因素分析[J].光学精密工程,1996,4(2):94-97. 被引量:8
  • 3杨向荣,张明,王晓临,曹万强.新型光刻技术的现状与进展[J].材料导报,2007,21(5):102-104. 被引量:10
  • 4谢永军.曲面激光直写技术[D].北京:中国科学院,2003.
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  • 6MEYERHOFER D. Characteristics of resist film produced by spinning[J]. Appl. Phys, 1978,49 ( 7 ) : 3993-3997.
  • 7DAUGHTON W J,GIVENS F L. An investigation of the thickness variation of spun on thin film com- monly associated with the semiconductor industry [J]. Electrochem. Soc, 1982,129(1) : 173-179.
  • 8FENG X G, SUN L C. Mathematical model of spin- coated photoresist on a spherical suhstrate[J]. Op- tics Express, 2005,18 (13) : 7070-7075.
  • 9YUE HD,PANLF,BIN Y J, etal.. Mechanics analysis in CD-R dye coating process[J]. SPIE, 2002,4930 : 253 -257.
  • 10ACRIVOS A, SHAH M J,PETERSEN E E. On the flow of a non-newtonian liquid on a rotating disk[J]. Appl. Phys, 1960,31 (6) :963-968.

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