摘要
氮化硅薄膜是芯片制造中广泛运用的一种绝缘薄膜,其可用作芯片表面的掩蔽膜及钝化膜。简要介绍IC制造中几种主要的氮化硅薄膜的制备技术,并探讨新型的制备技术。
Si3N4 film is widely used in IC manufacturing; it can be used for the screen and passivation fihn on the chip＇s surface. The paper introduces some main manufacturing technologies of Si3N4 film, and discusses some new manufacturing technologies.
出处
《常州信息职业技术学院学报》
2009年第1期19-21,共3页
Journal of Changzhou College of Information Technology
关键词
氮化硅
绝缘膜
掩蔽膜
钝化膜
Si3N4
insulator film
screen film
passivation fdm
