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微波放电氢等离子体的特性诊断和分析 被引量：2

THE CHARACTERISTIC ANALYSIS AND DIAGNOSIS OF HYDROGE PLASMA UNDER MICROWAVE DISCHARGE
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摘要 在微波等离子化学气相沉积装置中,分析了反应室内等离子密度空间分布以及等离子密度与气压和功率的关系,还分析了Hα(656.3 nm)的峰值强度与气压和功率的关系,得到了微波放电氢等离子体内部的基本特性. The density distribution and the relationship between the plasma density with different pressure and power were obtained in a microwave plasma vapor deposition reactor. The relationship between the intensity of Hα （656.3 nm）peak with different pressure and power were also analyzed. Thus the basic characteristic of hydrogen plasma under microwave discharge was gained.
作者 杨春林 陈俊芳 符斯列 史磊 张洪宾 黄孟祥 赖秀琼
机构地区 华南师范大学物理与电信工程学院
出处 《华南师范大学学报（自然科学版）》 CAS 2008年第3期66-70,共5页 Journal of South China Normal University(Natural Science Edition)
基金 国家自然科学基金资助项目(10575039) 教育部高等学校博士学科点专项科研资助项目(20040574008) 广东省自然科学基金重点资助项目(05100534)
关键词 LANGMUIR探针 等离子体密度 发射光谱 Hα langmuir probe plasma parameter emission spectrum Hα
分类号 TL65 [核科学技术—核技术及应用]
  • 相关文献

参考文献7

  • 1符斯列,陈俊芳,吴先球,王宁星,张茂平,胡社军.Spatial Distribution of ECR Plasma Density in ECR-PECVD Reaction Chamber[J].Plasma Science and Technology,2006,8(3):300-302. 被引量：5
  • 2CHEN J F, ZHAO W F, WU X Q. Ion density distribution in a inductively coupled plasma chamber[ J ]. Plas ma Science & Technology,2004,6(2) :2234 -2235.
  • 3马志斌,张文文.金刚石薄膜的低温沉积[J].武汉化工学院学报,2003,25(4):40-42. 被引量：4
  • 4FU S L, CHEN J F, HU S J. Study on the characteristics of ECR plasma spatial distribution[J]. Plasma Science & Technology,2006,15 : 187 - 192.
  • 5邓红艳,王加扣,吴卫东,程新路,杨向东.低温低压氢等离子体的光谱分析[J].原子与分子物理学报,2005,22(2):256-259. 被引量：7
  • 6KAWAI K, SASAKI K, KADOTA K. Measurements of electron density in helicon - wave excited high - density reactive plasmas by vacuum ultraviolet emission spectroscopy[J]. Plasma Sources Sci Technol, 1998,7:36 -40.
  • 7TANAKA S, XIAO B J, KAZUKI K. Hydrogen molecular effects on the Hα spectrum in low - temperature plasmas [ J ]. Plasma Phys Control Fusion, 2000,42 : 1091 - 1103.

二级参考文献26

  • 1陆同兴,赵献章,崔执凤.用发射光谱测量激光等离子体的电子温度与电子密度[J].原子与分子物理学报,1994,11(2):120-128. 被引量：32
  • 2Kawai, Sasaki K,Kadota K. Measurements of electron density in helicon-wave excited high-density reactive plasmas by vacuum ultraviolet emission spectroscopy[J]. Plamsa Sources Sci. Technol.1998, 7: 36～40.
  • 3Thorne A P. Spectrophysics[M].USA: London New York Chapman and Hall, 1988.
  • 4Griem H R. Plasma Spectroscopy[M]. USA: McGraw-Hill Book Company, New York,1964.
  • 5Gigosos M A, González M(A), Cardeosos V. Computer simulated Balmer-alpha,-beta and -gamma Stark line profiles for non-equilibrium plasmas diagnostics[J].Spectrochimica Acta Part,2003,B58:1489～1504.
  • 6Jovicevic S,Ivkovic M, Pavlovic Z,et al. Parametric study of an atmospheric pressure microwave-induced plasma of the mini MIP torch-Ⅰ. Two-dimensional spatially resolved electron-number density measurements[J].Spectrochimica Acta Part,2000,B55:1879～1893.
  • 7Fang T Z, Wang L, Jiang D M, et al. Helicon discharge using a Nagoya Type Ⅲ antenna[J]. Chin.Phys.Lett.,2001,18:1098～1100.
  • 8Schneider P, Dostalik W W, Springfield A D, et al. Langmuir probe studies of a helicon plasma system[J]. Plamsa Sources Sci. Technol,1999, 8: 397～403.
  • 9Tanaka Satoru, Xiao Bingjia, Kazuki Kobayashi, et al. Hydrogen molecular effects on the Hα spectrum in low-temperature plasmas[J].Plasma Phys.Control.Fusion,2000,42:1091～1103.
  • 10Toader E I. Plasma Sources Sci. Technol, 2004,13:646-653

共引文献13

同被引文献22

  • 1符斯列,陈俊芳,吴先球,王宁星,张茂平,胡社军.Spatial Distribution of ECR Plasma Density in ECR-PECVD Reaction Chamber[J].Plasma Science and Technology,2006,8(3):300-302. 被引量：5
  • 2Singh S B, Chand N,Patil D S. Langmuir probe diagnos-tics of microwave electron cyclotron resonance ( ECR)plasma[J]. Vacuum, 2009,83:372 -377.
  • 3Kar R,Barve S A,Singh S B,et al. Diagnostics of mi-crowave ECR generated plasma : Effect of contaminatedreference electrode[ J]. Vacuum,2010,85 ; 151 - 155.
  • 4Kenez L, Kardcsony J, Derzsi A. Theoretical model forstudy of the voltage - current curve of a Langmuir - probeused in the hot region of the ECR plasma [ J]. PhysicsLetters A,2008,372: 4927 -4931.
  • 5Kenez L, Kitagawa A, Karacsony J,et al. Study of thebiased - disc effect using Langmuir - probes inserted inthe hot region of the electron cyclotron resonance ionsource ( ECRIS ) plasma [ J ]. Physics Letters A,2008,372: 2887 -2892.
  • 6[美]迈克尔.A .力伯曼,阿伦. J .里登伯格.等离子体放电原理与材料处理[M].蒲以康,等译.北京:科学出版社,2007,144.
  • 7Seker Z, Ozdamar H, Esen M, et al. The effect of nitro-gen incorporation in DLC films deposited by ECR Micro-wave Plasma CVD[ J ]. Applied Surface Science, 2014,314: 46-51.
  • 8ZHANG T, TAN W W. Development of environmental intelligent textile fiber with the support of biotechn- ology [J]. Applied Mechanics and Materials, 2013, 401:2101 -2104.
  • 9YU M, GU G, MENG W D, et al. Superhydrophobic cotton fabric coating based on a complex layer of silica nanoparticles and perfluorooctylated quaternaryammonium silane coupling agent [ J]. Applied Surface Science, 2007, 253 (7) : 3669 - 3673.
  • 10TESHIMA K, SUGIMURA H, INOUE Y, et al. Transparent ultra water-repellent poly ( ethylene terephthalate) substrates fabricated by oxygen plasma treatment and subsequent hydrophobic coating [J]. Applied Surface Science, 2005, 244 ( 1 ) : 619 - 622.

引证文献2

二级引证文献11

华南师范大学学报（自然科学版）
2008年 第3期

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