摘要
随着电子工业的飞速发展,高性能、大尺寸的氧化铟锡(ITO)靶材需求量与日俱增。本文概述了ITO靶材的制造技术和应用,并对目前国内外ITO靶材现状和发展进行了一定的分析和研究。
The demand for sputtering target materials with high performance and big size are increased with rapid development of electronic industry. The manufacture and application of ITO sputtering target is reported in this paper. Also the domestic and overseas state and development of ITO sputtering target is analyzed and researched.
出处
《湖南科技学院学报》
2007年第12期47-48,共2页
Journal of Hunan University of Science and Engineering
关键词
ITO靶材
透明导电膜
常压烧结法
ITO sputtering target
Ttransparent conductive film
Non-pressure sintering
