摘要
用射频等离子体增强化学汽相沉积技术合成Ｃ３Ｎ４薄膜，并采用强迫晶化技术，经透射电子衍射观测，薄膜具有多晶结构．用Ｘ射线光电子能谱测试了Ｃ，Ｎ原子结合能及含氮量．傅里叶变换红外光谱曲线表明薄膜中不含石墨相．测得薄膜的维氏硬度为２９．２—５０．
Nitride carbon thin films have been deposited by plasma enhanced chemical vapor phase deposition. The results of transmission electron diffraction indicated that films have polycrystal structures. Carbon and nitrogen atoms binding energies and the nitrogen content of the films are measured out by X ray photoelectron spectroscopy.The Fourier transform infrared spectrum show that there is no graphite phase in the films,and the Vickers hardness of the films vary from 29 2 to 50 0GPa.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1997年第3期530-535,共6页
Acta Physica Sinica
基金
国家自然科学基金资助的课题
