摘要
采用直流与射频磁控反应溅射法在硬质合金YG8衬底上制备了氮化碳(carbon nitride,CNx)薄膜。研究了溅射方式、衬底腐蚀处理对薄膜摩擦学性能的影响。结果表明:射频反应磁控溅射制备的CNx薄膜的膜基结合力和摩擦因数明显高于直流反应磁控溅射薄膜的,适当的负偏压可以提高膜基结合力。衬底化学腐蚀预处理能够大幅度提高CNx薄膜的膜基结合力,对直流溅射CNx薄膜的摩擦因数影响不大,但能降低射频溅射CNx薄膜的摩擦因数。射频反应磁控溅射法制备的CNx薄膜比直流溅射法制备的CNx薄膜耐磨性能好。衬底化学腐蚀预处理和溅射时对衬底施加适当的负偏压均有利于耐磨性能的提高。
The carbon nitride （CNx） films were deposited on a YG8 carbide alloy substrates by direct current （DC） or radio frequency （RF） magnetron.The effects of depositing method and corrosion of YG8 substrates on the tribological properties of the CNx films were investigated.The results reveal that the adhesion and friction coefficients of the CNx films prepared by RF magnetron sputtering are higher than that prepared by DC magnetron sputtering.The results show that the substrate bias could improve the adhesion of the films.The corrosion of the YG8 substrates had an effect on the adhesion,which could reduce the friction coefficients of the RF sputtering films but had a slight effect on those of the DC sputtering films.The wear resistance of the CNx films deposited by RF magnetron sputtering was higher than that by DC magnetron sputtering.The corrosion of the YG8 substrates and the substrate bias both favored the improvement of the wear resistance of the CNx films.
出处
《硅酸盐学报》
EI
CAS
CSCD
北大核心
2010年第1期126-130,共5页
Journal of The Chinese Ceramic Society
关键词
氮化碳薄膜
磁控溅射
摩擦学
腐蚀
carbon nitride film
magnetron sputtering
tribology
corrosion
