摘要
采用微波等离子体化学气相沉积法（ＭＰＣＶＤ），用高纯氮气（９９．９９９％ ）和甲烷（９９．９％ ）作反应气体，在多晶铂（Ｐｔ）基片上沉积Ｃ３Ｎ４ 薄膜。利用扫描电子显微镜（ＳＥＭ）和扫描隧道显微镜（ＳＴＭ）观察薄膜形貌表明，薄膜由针状晶体组成。Ｘ射线能谱（ＥＤＸ）分析了这种晶态Ｃ－Ｎ膜的化学成分。对不同样品不同区域的分析结果表明，Ｎ／Ｃ比接近于４／３。Ｘ射线衍射结构分析说明该膜主要由β－Ｃ３Ｎ４ 和α－Ｃ３Ｎ４ 组成。利用Ｎａｎｏ ｉｎｄｅｎｔｅｒ Ⅱ测得Ｃ３Ｎ４ 膜的体弹性模量Ｂ达到３４９ ＧＰａ，接近ｃ－ＢＮ（３６７ ＧＰａ）的体弹性模量，证明Ｃ３Ｎ４ 化合物是超硬材料家族中的一员。
C 3N 4 thin films have been prepared on Pt substates by microwave plasma chemical vapor deporsition (MPCVD) technique.Gas mixture containing CH 4,N 2 at various ratios was used as the source gas.The investigation of the surface morphologies of the deposited films by SEM and STM indicated that the films were composed of acicular crystals.Energy dispersive X ray(EDX) analysis suggested that N/C ratios of the films can be as high as 1.33.X ray diffraction experiments showed that the films consisted of α C 3N 4 and β C 3N 4.The films showed a high bulk modulus of 349 GPa in Nano indentor hardness tests.
出处
《河北科技大学学报》
CAS
1999年第4期1-4,共4页
Journal of Hebei University of Science and Technology
基金
国家自然科学基金!(19674009)
