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高分辨二次电子像中的成分衬度 被引量:6

Composition Contrast in High Resolution Secondary Electron Image
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摘要 从理论上阐明了获得高分辨二次电子成分衬度像的原理、条件和方法,并作了细致的实验验证,空间分辨率为3.3nm(V0=5kV),原子序数分辨率为0.03Z。实验研究样品为分子束外延AlGaAs量子阱激光器,其分层结构的最小层宽为7nm,测得的层宽和透射电镜测量结果相吻合,由于透射电镜制样的复杂和困难。 The principle,condition and method for obtaining high resolution composition contrast in secondary electron image have been theoretically clarified,corresponding experimental research work has been carried out.Spacial resolution is 3.3nm( V 0 =5kV),and atomic number resolution 0.03Z.Specimen taken for experiment is single quantum well laser with its minimum layer width of 7nm.The measured layer widths are consistent with that of TEM.Owing to the simplicity in making sample as compared with that of TEM,the method of high resolution composition contrast in secondary electron image possesses important theoretical and applied value.
出处 《电子显微学报》 CAS CSCD 1997年第1期1-5,共5页 Journal of Chinese Electron Microscopy Society
关键词 成分衬度 场发射扫描电镜 电子显微镜 secondary electron image composition contrast Field emission SEM
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参考文献1

  • 1张大同,扫描电子显微技术与X射线显微分析(译),1988年,51页

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