摘要
研究了在直流热阴极辉光放电等离子体化学气相沉积制备金刚石厚膜的工艺过程中,放电电流和甲烷浓度对金刚石膜应力-应变特性的影响规律.
This paper focuses on the influences of the discharge current and methane concentration on the stress-strain properties of Chemical Vapor Deposition （CVD） thick diamond films. This has laid good foundations for the promotions of the qualities, especially the mechanical properties of thick diamond films.
出处
《吉林大学学报（理学版）》
CAS
CSCD
北大核心
2006年第5期784-786,共3页
Journal of Jilin University:Science Edition
基金
"863"计划新材料领域资助项目基金(批准号:2002AA325090)
关键词
化学气相沉积
金刚石膜
应力-应变
chemical vapor deposition
diamond films
stress-strain
