摘要
我们在一台制作第三代象增强器的超高真空系统中安装了俄歇（Ａｕｇｅｒ）能谱仪，以其对ＧａＡｓ光电阴极的制备过程进行在线监测分析，其中包括选择性腐蚀过程的俄歇观测，阴极激活前清洁措施的效果评价和Ｃｓ－Ｏ激活过程中Ａｓ／Ｇａ俄歇信号比对光电灵敏度的影响，Ｃｓ源纯度的分析及对光电发射的影响。根据分析结果，激活出了１０００μＡ／ｌｍ的反射式光电阴极和５００μＡ／ｌｍ的透射式光电阴极。
s The fabrication steps of photocathode for the third generation image intensifier have been studied by an Auger Eletron Spectroscope in situ a UHV system. In this paper,the resultant surface after selective etching are evaluated,the effects of the cleaning procedures before activation are com-pared,the relation between As/Ga Auger signal ratio and photoemission are reported.Photoemission as high as S=1000μA/lm has been obtained with a reflective GaAs cathode and S=500μA/lm with a transmissive cathode.
出处
《光子学报》
EI
CAS
CSCD
1996年第10期902-905,共4页
Acta Photonica Sinica
关键词
光电阴极
热清洁
激活
俄歇分析
Photocathode
Etching
Surface cleaning
Activation
