摘要
利用电弧离子镀方法,在(SCM415)钢基体上制备了Cr-Si-N薄膜.通过调节Cr-Si靶中Si的比例,沉积了Si含量不同的Cr-Si-N薄膜.讨论了Si含量、偏压对薄膜硬度的影响.添加Si后得到的纳米复合薄膜Cr-Si-N的硬度比单纯的CrN薄膜有了显著的提高.采用X射线衍射(XRD)和X射线光电子能谱(XPS)对Cr-Si-N薄膜进行分析,研究讨论了Cr-Si-N薄膜的成分、结构及薄膜硬度增强的微观机制.
Cr Si N coatings by incorporating several atomic percentage of Si to CrN were prepared, using an arc ion plating method. In order lo change the Sicontent in the coatings, CrSi targets of 5%, 10%, 15% Siwere used. Carburized＇Chromium Molybdenum Steel,s （SCM415） were used as the,substrates. The aim of this study is to investigate the influence of Si incorporation and bias voltage on the microstructure and hardness of the coatings. The hardness of the coatings increa,sed drastically compare with GrN coating with very small quantity of Siincorporated. With X-ray diffraction （XRD） and X-ray photoelectron spectroscopy （XPS） the micro.structure composition were studied.
出处
《西南师范大学学报（自然科学版）》
CAS
CSCD
北大核心
2006年第3期52-56,共5页
Journal of Southwest China Normal University(Natural Science Edition)
基金
西南大学发展基金资助项目(SWNUF2005001)
