摘要
叙述了ｉ－ｌｉｎｅ光刻高均匀照明系统的均匀照明原理，以及其具有特殊面形（非球面）、特殊结构（非共轴）、超光学表面（由多个非共轴光学表面组成）的光学系统的光能分布计算模拟的原理、方法。作为例子，用所编写的程序计算模拟了我们近来设计的一曝光系统几个重要光学表面上具有权重的点列图和光能分布曲线。
The principle of i line uniform illumination optical system for photolithography,and the principle,method used in calculation and simulation of the intensity distribution of the special surface shape(aspherics),special structure(non coaxis) and super optical surface(including multiple non coaxial optical surface) are described in the paper. As an example,the sopt diagram with weighting and the light intensity curve on the several important optical surfaces designed recently are simulated by the program compiled by ourselves.
出处
《光电工程》
CAS
CSCD
1996年第2期1-6,共6页
Opto-Electronic Engineering
基金
中国科学院"八.五"重大项目
关键词
分步重复光刻机
照明光学
光能分布
计算机模拟
Step and repeat photoetching machines,Illumination Optical systems,Intensity distribution,Computer simulation.
