摘要
随着半导体技术的不断发展,新的工艺和技术不断出现,与此同时对新工艺及其结果有足够的认识也是十分必要的。本实验就是基于这一目的,对硅器件工艺中最新采用的液相钝化膜作详细分析,为了对其结构有足够深入的了解,我们同时分析了氧离子注入氧化膜,自然氧化膜,真空室制备的氧化膜,热生长氧化膜及离子溅射氧化膜,以便比较其结构上之差别。结果发现,无论是哪一种氧化膜,其Si—SiO_2界面层都不是单纯的SiO_2,而是SiOx(1≤x≤2)。除液相钝化膜外,其他各种界面过渡层均含Si(e^-O_3)及O_2—Si结构,而且热生长氧化膜和离子溅射氧化膜的过渡层中还存在Si—Si_4原子团。
Several silicon oxide film surfaces and interfaces have been studied in different ways.In this report we studied the silicon oxide film grown in liquid by Auger electron energy spectroscoy. The result shows the Si-SiO2 interface of this film is different from that of the others silicon oxide films.The interfaces of the others films contain the structures of Si(e-O3) and O2-Si, but this film does not. So we think this film is very useful in microelectronic technology.
基金
中科院自然科学基金
